05-14-2011

                  Portland Nanoscience and Nanotechnology Academy (PNNA)

Spring 2011                                                                                                                    March 28 – June 5th  

                      Nanomaterials Fabrication  NANOFAB -2011

                                                      CH 445/545  (02 credits),       PH 410/510 (04 credits)    

                                Section 03:   Lab: W 8-12 noon   and   Th  8-12 noon;     Lecture: F: 11:00 – 1:00 p.m. 
                                Section 04:   Lab:  W 8-12 noon  and    Th  1-5 p.m.;       Lecture: F: 11:00 – 1:00 p.m. 
                                Section 05:   Lab: W 1-5 p.m.      and    Th   8-12 noon;   Lecture: F: 11:00 – 1:00 p.m
                                Section 06:   Lab: W 1-5 p.m.      and   Th   1-5 p.m.;       Lecture: F: 11:00 – 1:00 p.m

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The Portland Nanoscience and Nanotechnology Academy (PNNA)—comprised of faculty members from Portland
State University (across six academic departments) offers this hands-on training course, Nanomaterials Fabrication
NanoFab 2011, on techniques currently used in the fabrication and characterization of materials with an emphasis
on nanotechnology applications. The organization of this course constitutes an initial step taken by the PNNA group
towards establishing a Career Track or Specialization on Nanotechnology at PSU (through a series of similarly organized
crosslisting courses) aiming to help students obtain a professional formation with a multidisciplinary perspective.

NanoFab is organized with a backbone of main topics of interest, still allows fulfilling its objectives though additional
contemporary topics. This flexibility allows updating the course with current disruptive techniques, thus students
are exposed to an updated professional education. For Spring-2011 the course has concatenated a series of experimental
training sessions required to implement and understand lithography processes, which confluence into a final photolithography
session using a projection mask aligner tool. In parallel, the course is enriched by a series on technically and scientific
oriented lectures on bio-environmental themes (environmental bio-minerals, microbial crystallography) and
fabrication/characterization techniques that, if not recently adopted by the marketplace,  they are still under development
(namely , dip pen nanolithography, and nano-optical techniques that, overcoming the diffraction brriers, make optics accesible
to the mesoscopic regime.) 

I. OUTLINE                                                                                 

      Each experiment will be performed in either two or three weeks, according to the following chronogram:

                                 WEDNESDAY                                                                       THURSDAY

     -----------------------------------------------------------------------------------------------------------------------------------------------------------  
      Week-1:                                                                                  Exp-1.    Photolithography software: PROLITH

      Week-3:     Experiment 2 continues                                          Exp-3.     Growth kinetic of oxide on silicon

      ---------------------------------------------------------------------------------------------------------------------------------------------------------- 

      Week-2:  Top-down Approach to Nanotechnology:
        “Fundamentals of MEMS and Microsystems.”         By Lemmy Mekisho
                                                                                      (Mechanical and Materials Engineering Department)
 

       "Bottom-up Approach to Nanotechnology"              By Mingdi Yan (Chemistry Department)

II. COURSE ORGANIZATION

      Week 01

      LABORATORY SESSION
      Thursday March 31^st  
      Place:                       SB2 Room B2-71
      Experiment #1:        “Photolithography software: PROLITH”
      Instructor:                Shankar Rananavare
      Bibliography:            Laboratory Notes: Photolihography Software

      FRIDAY LECTURES
      Friday April 1st   Time: 11:00 a.m.     Place: SB1-304    Attendance by all sections is required

Week 03

      LABORATORY SESSIONS (Wednesday and Thursday)

    Instructor:          Shankar Rananavare (Chemistry Department)

    Bibliography:      Laboratory Notes: Growth of oxide on silicon  

   LECTURES  
       Friday April 15^th     Time: 11:00  Place: SB1-304       Attendance by all sections is required 
       11:00 – 11:40   a.m.         Title:             Nanolithography on Responsive Materials              Abstract       Presentation    
                                             Speaker:         Andres La Rosa (Physics Department) and Mingdi Yan (Chemistry Department )

Week 04

    LABORATORY SESSIONS (Wednesday and Thursday)

      LECTURES

      Friday April 22^nd      Time: 11:00  Place: SB1-304       Attendance by all sections is required   

     Title:                  “Nanometer localization of optical markers”   11:00 – 11:40 a.m.

     Speaker:            Rodolfo Fernandez/ Andres La Rosa  (Physics Department)

    Title:                  “Microbial Crystallography”    11:50 – 12:30 p.m.

    Speaker:           Radu Popa  (Biology Department)

Week 05

       LABORATORY SESSIONS (Wednesday and Thursday)

       Wednesday April 27^th  
       Experiment #4:   “Dip Pen nanolithography on responsive materials”
       Place:                  SB1 Room 30
       Instructor:           Damian Hegsted and A.la Rosa (Physics Department) 
       Bibliography:       Sample Preparation Procedure (P4VP films)
                                    Sample thickness

Wednesday May 4^th     
Continuation of experiment #4: “Dip Pen nanolithography on responsive materials”
Place:               SB1 Room 30
Instructor:        Damian Hegsted and A.la Rosa (Physics Department)

Week 07

LABORATORY SESSIONS (Wednesday and Thursday)
Wednesday May 11^th   
      Continuation of experiment #4: “Dip Pen nanolithography on responsive materials”
      Place:                 SB1 Room 30
       Instructor:         Damian Hegsted and A.la Rosa (Physics Department)

Week 08

LABORATORY SESSIONS (Wednesday and Thursday)
Wednesday May 18^th
       Experiment  #7: “Nanometer Localization of optical markers”
       Place:                  SB1 Room 30         
       Instructor:          Rodolfo Fernandez (Physics Department)

Week 09

LABORATORY SESSIONS (Wednesday and Thursday)

Week 10

LABORATORY SESSIONS (Wednesday and Thursday)

Wednesday June 1^st
       Continuation of experiment  #5: ““Nanometer Localization of optical markers”
       Place:                 SB1 Room 30
       Instructor:      Rodolfo Fernandez (Physics Department)

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Course requirements 

Students are expected to attend all lectures, perform all 10 lab experiments, and keep a lab notebook (where data from all experiments should be recorded).

For students registering in the 400 level:

                   Five write-up labs will be required.

For students registering in the 500 level: 

                   In addition to four write-ups, student must select one lab topic for a journal-style report.

For the journal style report: Students should start working on the subject right away. Identify the journal.

The write-ups must include the following sections: Abstract, Description, Apparatus, Results, and Conclusions sections.       

              The reports should be typed and neat.

Reports will be graded by the of the corresponding instructor of a given experiment

Suggested prerequisites

PH 314 Methods of Experimental Physics I (or equivalent), or

PH 440 Physics of Solid State Devices (or equivalent), or

CH 334 Organic Chem I (or equivalent).